Pulse Laser Deposition Workstation (PLD2000)-PVD Products LTD

Pulse Laser Deposition (using 193 nm and 243nm lasers)

Characteristics:

• Maximum substrate size: Single 2-inch diameter or multiple small samples
• Maximum substrate temperature: 1,000°C (in oxygen) for nontransparent substrates
• Temperature uniformity: ± 8°C across a 2-inch diameter Si substrate at 800°C
• Operating Pressure Range: 1 x 10^-7 Torr base to 500 mTorr
• Target Size: Six (6) 2-inch diameter targets by 6 mm thick with adapters for smaller sizes
• Target to Substrate (Throw) Distance: 40-95 mm adjustable
• Nominal Angle of incidence of the laser beam on target: 60 degrees
• Laser: COMPEX 201 Excimer laser, Fluorine Version
• Operational Wavelength: 248-nm (KrF) and 193 nm (ArF)