Pulse Laser Deposition Workstation (PLD2000)-PVD Products LTD
Pulse Laser Deposition (using 193 nm and 243nm lasers)
Characteristics:
- Maximum substrate size: Single 2-inch diameter or multiple small samples
- Maximum substrate temperature: 1,000°C (in oxygen) for nontransparent substrates
- Temperature uniformity: ± 8°C across a 2-inch diameter Si substrate at 800°C
- Operating Pressure Range: 1 x 10-7 Torr base to 500 mTorr
- Target Size: Six (6) 2-inch diameter targets by 6 mm thick with adapters for smaller sizes
- Target to Substrate (Throw) Distance: 40-95 mm adjustable
- Nominal Angle of incidence of the laser beam on target: 60 degrees
- Laser: COMPEX 201 Excimer laser, Fluorine Version
- Operational Wavelength: 248-nm (KrF) and 193 nm (ArF)